Boride Ceramic Sputtering Target
Chromium Boride (Cr2B) Neodymium Boride (NdB2) Chromium Boride (CrB2) Tantalum Boride (TaB) Chromium Boride (CrB) Tantalum Boride (TaB2) Chromium Boride (Cr5B3) Titanium Boride(TiB2) Hafnium Boride (HfB2) Tungsten Boride (WB) Iron Boride (FeB)...
China
Main Item
sputtering target, coating materials
Business Type
Manufacturer
Ceramic Sputtering Targets
Ceramic Sputtering Targets: Beijing Goodwill Metal Technology Co.Ltd offer a full series ceramic sputtering target(Oxide sputtering target, Fluiride sputtering target, Boride sputtering target, Carbide sputtering target, Nitride sputtering target,...
China
Main Item
sputtering target, coating materials
Business Type
Manufacturer
Hafnium Hf sputtering target
Hafnium (Hf) Element Basic Information Name: Hafnium Symbol: Hf Atomic Number: 72 Atomic Mass: 178.49 amu Melting Point: 2150.0 °C (2423.15 °K, 3902.0 °F) Boiling Point: 5400.0 °C (5673.15 °K, 9752.0 °F) Number of Protons/Electrons: 72 Number of...
China
Main Item
sputtering target, coating materials
Business Type
Manufacturer