Sputtering Target

Sputtering Target

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China rare metal material Co., ltd have vacuum melting furnace, HIP, HP, CIP machine. Our cold crubile melting furnace can sure raw material's purity. HP machine can make biggest diameter upto 365mm, It can be sure satisfied almost customer's need. Metal ...
China

Sputtering Plate

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Purity: 98%, 99%, 99.5%, 99.9%, 99.95%, 99.99%, 99.999% 1.) Oxide sputtering target: La2O3, CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, Y2O3, Ta2O5, Nb2O5, Ga2O3, V2O5, ZrO2 doped with Ti, WO3, HfO2, MgO, ...
China
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